Calibre Mask Process Correction
Calibre MPCpro
Calibre MPCpro is a solution for systematic errors introduced by e-beam lithography and mask etching processes built on Calibre OPCpro™ technology for optical process correction. |
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Calibre nmMPC
Calibre nmMPC provides optimizations specifically developed for e-beam mask writers. New correction and modeling capabilities improve mask CD linearity and uniformity for advanced nodes, especially for smaller feature sizes (such as SRAFs). |
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