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Calibre® Computational Lithography
The Calibre computational lithography solution provides core innovations that ensure image fidelity across multiple process conditions, providing more robustness and reliability in the manufacturing process.
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Calibre Mask Process Correction
The Calibre Mask Process Correction solution applies Mentor's model-based OPC technology with optimizations specifically developed for e-beam mask writers.
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Calibre Mask Data Preparation
Mentor's Mask Data Preparation (MDP) solution is fully compatible with the Calibre platform, enabling you to complete all resolution enhancement processing and mask data format conversion tasks in one mask fabrication batch run using a single control language.
